SP3 recently introduced the Model 665, a new hot wire chemical vapor deposition equipment. The new dual-reactor unit accommodates 18 substrates with a diameter of 100 mm at a time, which means that the deposition area is doubled compared to its earlier single reactor equipment. Compared with the earlier products, Model 665 doubles the output capacity based on the original CVD diamond growth quality, deposition rate and process consistency, so the cost of acquisition is significantly reduced.
Customer demand for high-efficiency, low-cost equipment has driven the development of higher-capacity equipment. Currently, the major markets that are entering full commercialization include polishing pads for chemical mechanical polishing and diamond coated electrodes for water treatment. In the future, it is expected to extend a new generation of devices that can achieve higher throughput based on the Model 665, in order to apply to the diamond sandwich growth of semiconductor wafers.
“CVD diamond materials are fully commercialized,†said Dwain Aidala, president and chief operating officer of SP3. “Because diamonds’ intrinsic value has been widely recognized, it has been developed and single-piece trial production in certain high-growth areas. Entering the mass production stage, size and capacity are the key elements at the moment. More and more customers are using CVD diamond materials in production, and we are able to provide high-capacity equipment, which is unique in the market."
Based on its unique performance in terms of wear resistance and chemical inertness, CVD diamond is an ideal material for the polishing pad for chemical mechanical polishing. In the field of semiconductor manufacturing, the application of chemical mechanical polishing is growing rapidly, as reflected in the chemical mechanical polishing process steps, the number of metallization layers and the types of materials to be polished. This requires a CVD diamond polishing pad with a finer line width and better compatibility with increasingly complex polishing fluids and polishing pad structures.
Another rapidly growing market for CVD diamonds is the diamond coated electrode for water treatment. These electrodes are increasingly being used in industrial water treatment and water filtration systems. Diamond materials exhibit the advantages of chemical inertness and selective doping to ensure long life and high reliability.
About Model 665
Model 665's new dual reactor architecture features the features and benefits of sp3's current equipment, such as excellent thickness uniformity, high throughput, superior process repeatability, precise process control and low operating costs. Compared with the Model 650, the Model 665 only adds less than 40% of the cost, while the production capacity has doubled, thus greatly reducing the cost of acquisition.
The two reactors of Model 665 always run the same process, and the process controller, circuit system, gas piping system and vacuum control system control the two reactors synchronously. The gas and vacuum lines have been specifically designed to precisely balance the pressure and gas flow in both chambers to ensure precise control of the deposition process. The equipment uses an existing deposition process that requires only minor adjustments to the vacuuming and cooling steps. The operation is also very similar to the Model 650. The difference is only that it is loading and unloading the two reactors, and the user interface is also the information of the two reactors. In addition, process control including gas, pressure, process setup and operation, as well as safety devices and data logging, are no different from the Model 650. (
Customer demand for high-efficiency, low-cost equipment has driven the development of higher-capacity equipment. Currently, the major markets that are entering full commercialization include polishing pads for chemical mechanical polishing and diamond coated electrodes for water treatment. In the future, it is expected to extend a new generation of devices that can achieve higher throughput based on the Model 665, in order to apply to the diamond sandwich growth of semiconductor wafers.
“CVD diamond materials are fully commercialized,†said Dwain Aidala, president and chief operating officer of SP3. “Because diamonds’ intrinsic value has been widely recognized, it has been developed and single-piece trial production in certain high-growth areas. Entering the mass production stage, size and capacity are the key elements at the moment. More and more customers are using CVD diamond materials in production, and we are able to provide high-capacity equipment, which is unique in the market."
Based on its unique performance in terms of wear resistance and chemical inertness, CVD diamond is an ideal material for the polishing pad for chemical mechanical polishing. In the field of semiconductor manufacturing, the application of chemical mechanical polishing is growing rapidly, as reflected in the chemical mechanical polishing process steps, the number of metallization layers and the types of materials to be polished. This requires a CVD diamond polishing pad with a finer line width and better compatibility with increasingly complex polishing fluids and polishing pad structures.
Another rapidly growing market for CVD diamonds is the diamond coated electrode for water treatment. These electrodes are increasingly being used in industrial water treatment and water filtration systems. Diamond materials exhibit the advantages of chemical inertness and selective doping to ensure long life and high reliability.
About Model 665
Model 665's new dual reactor architecture features the features and benefits of sp3's current equipment, such as excellent thickness uniformity, high throughput, superior process repeatability, precise process control and low operating costs. Compared with the Model 650, the Model 665 only adds less than 40% of the cost, while the production capacity has doubled, thus greatly reducing the cost of acquisition.
The two reactors of Model 665 always run the same process, and the process controller, circuit system, gas piping system and vacuum control system control the two reactors synchronously. The gas and vacuum lines have been specifically designed to precisely balance the pressure and gas flow in both chambers to ensure precise control of the deposition process. The equipment uses an existing deposition process that requires only minor adjustments to the vacuuming and cooling steps. The operation is also very similar to the Model 650. The difference is only that it is loading and unloading the two reactors, and the user interface is also the information of the two reactors. In addition, process control including gas, pressure, process setup and operation, as well as safety devices and data logging, are no different from the Model 650. (
Check Valve,Swing Check Valve,Water Check Valve,Stainless Steel Check Valve
Wenzhou Dico Valve Technology Co.,Ltd. , https://www.dicovalves.com